RF Matching Network is a product independently innovatively developed by RF Match Research lnc; The customized RF matching topology design, real-time online measurement technology, and innovative control algorithms ensure that the RF matching network has better performance, higher RF power efficiency, more precise control, and higher reliability. Compared with traditional RF networks, the RF energy efficiency is 5% -12% higher;Our product can achieve fast matching from the first level to the second level; The reflected power is less than 1% of the Forward power; The repeatability between units are higher than 97%.
Our RF matching network is suitable for plasma pulse processes with high process requirements, and is widely used in industries such as solar, semiconductor manufacturing, and material modification. Its main characteristics are as follows:
RaHigh RF power efficiency: Using customized RF topology and improved network technology, the average energy efficiency is 5% -12% higher.
Fast matching:Using online real -time measurement technology to quickly control technology，achieving fast matching.
High reliability: Using adaptive matching path algorithm to ensure the reliability of the RF matching network matching, thereby achieving high reliability RF impedance matching and providing high reliability guarantee for the consistency of plasma chamber process.
High precision: Optimize the automatic matching algorithm of the RF matching network to control the adjustable devices of the RF matching network more quickly and accurately, thereby achieving a reflection power lower than 1% of the incident power.
